The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Jul. 03, 2024
Vicis Ip, Llc, New York, NY (US);
University of Washington, Seattle, WA (US);
Per Reinhall, Seattle, WA (US);
Paul C. Leonard, Woodinville, WA (US);
Travis Edward Glover, Seattle, WA (US);
Andre Hunter Paggao Stone, Seattle, WA (US);
Anton Perry Alferness, Seattle, WA (US);
Kurt V. Fischer, Edmonds, WA (US);
Gary S. Kaplan, Mountain View, CA (US);
John T. Dardis, Ii, Seattle, WA (US);
Samuel R. Browd, Seattle, WA (US);
UNIVERSITY OF WASHINGTON & VICIS IP, LLC, New York, NY (US);
Abstract
A garment worn by a wearer has an exterior shell and an interior shell with various impact absorbing material between the exterior shell and the interior shell. The impact absorbing material includes multiple structures, such as rods or filaments, capable of deforming when force is applied then returning to its state prior to application of the force. In various embodiments, a rate sensitive material (RSM) is positioned in one or more locations relative to the exterior shell and the interior shell of the garment to further attenuate impacts to the garment. The RSM changes its resistance to force based on a rate at which the material is loaded.