The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Nov. 29, 2024
Applicant:
Vanam Inc., Seoul, KR;
Inventors:
Soo Deok Han, Seoul, KR;
Won Young Choi, Seoul, KR;
Assignee:
VANAM INC., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01C 7/00 (2006.01); H01C 7/108 (2006.01); H01C 17/08 (2006.01); H01C 17/12 (2006.01);
U.S. Cl.
CPC ...
H01C 7/006 (2013.01); H01C 17/08 (2013.01); H01C 17/12 (2013.01); H01C 7/008 (2013.01); H01C 7/108 (2013.01);
Abstract
The present technology relates to an oxide thin film. The oxide thin film of the present technology may include a single crystal substrate; and a main oxide layer laminated on the single crystal substrate and doped with dissimilar metal elements, wherein in energy-dispersive X-ray spectroscopy (EDX) using a transmission electron microscope (TEM), the dissimilar metal elements and metal elements of a metal oxide constituting the main oxide layer may be uniformly distributed. The present technology may provide an oxide thin film showing MIT characteristics of improved reliability, sensitivity, accuracy, and reproducibility.