The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Jun. 16, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Pawan Prasad Bindigan Hariprasanna, Bengaluru, IN;
Saikat Kumar Das, Bengaluru, IN;
Green Rosh K S, Bengaluru, IN;
Lokesh Rayasandra Boregowda, Bengaluru, IN;
Balvinder Singh, Bengaluru, IN;
Venkat Ramana Peddigari, Bengaluru, IN;
Alok Shankarlal Shukla, Bengaluru, IN;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method for removing an artifact in a high resolution image by an electronic device is provided. The method includes receiving the high resolution image comprising the artifact. Further, the method includes downscaling the high resolution image into a plurality of lower resolution images. Further, the method includes removing the artifact from the plurality of lower resolution images by applying at least one first machine learning model from a plurality of machine learning models on the plurality of lower resolution images. Further, the method includes generating a high resolution image free from the artifact by applying at least one second machine learning model from the plurality of machine learning models on an output from the at least one first machine learning model. The output from each of the machine learning model comprises a low resolution image free from the artifact.