The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Sep. 29, 2021
Applicant:

Oerlikon Surface Solutions Ag, Pfäffikon, Pfäffikon, CH;

Inventors:

Siegfried Krassnitzer, Feldkirch, AT;

Marijana Mionic Ebersold, Dübendorf, CH;

Siva Phani Kumar Yalamanchili, Sargans, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 14/32 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0641 (2013.01); C23C 14/325 (2013.01); C23C 14/3407 (2013.01);
Abstract

A method for producing coated substrates involving deposition of at least one coating layer on a surface of the substrate. The coating layer is synthesized in the interior of a vacuum coating chamber by using reactive PVD cathodic evaporation techniques. Nitrogen gas is introduced in the vacuum coating chamber to be used as reactive gas, and at least one arc evaporation source comprising a target material operated as cathode for evaporating the target material is used. The method involves a reactive deposition of aluminium titanium nitride as a result of a reaction between aluminium and titan from the target material with nitrogen from the nitrogen gas comprised in the coating chamber.


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