The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Sep. 16, 2020
Applicant:

Indian Institute of Technology Bombay, Mumbai, IN;

Inventors:

Prasanna Subhash Gandhi, Mumbai, IN;

Makrand Ashok Rakshe, Satara, IN;

Tanveer Ul Islam, Banihal, IN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 43/00 (2006.01); C12M 1/00 (2006.01); C12M 1/12 (2006.01);
U.S. Cl.
CPC ...
C12M 25/06 (2013.01); C12M 23/20 (2013.01); B29C 43/00 (2013.01);
Abstract

Embodiments herein disclose a method for fabricating high aspect ratio structures. The method includes depositing a predefined quantity of a viscoelastic fluid on a top surface of a bottom cell plate and compressing the viscoelastic fluid deposited on the top surface of the bottom cell plate using a bottom surface of a top cell plate. The viscoelastic fluid is a blend of a solvent and a polymer. At least one of the top cell plate and bottom cell plate comprises a plurality of lands, sealed source holes and/or unsealed source hole for penetration of a low-viscous fluid. Further, the method includes separating the top cell plate and the bottom cell plate to induce out of plane stretching of the high viscous fluid and obtaining a plurality of high aspect ratio structures between the top cell plate and the bottom cell plate due to the penetration of the low-viscous fluid.


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