The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Jan. 17, 2024
Applicant:

United States Department of Energy, Washington, DC (US);

Inventors:

Anirudha V. Sumant, Plainfield, IL (US);

Shikai Deng, Shanghai, CN;

Assignee:

UNITED STATES DEPARTMENT OF ENERGY, Washington, DC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/36 (2006.01); A01N 59/16 (2006.01); A01P 1/00 (2006.01); C23C 16/27 (2006.01); C23C 16/511 (2006.01); C23C 16/56 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
C03C 17/3607 (2013.01); A01N 59/16 (2013.01); A01P 1/00 (2021.08); C03C 17/3634 (2013.01); C03C 17/3644 (2013.01); C23C 16/274 (2013.01); C23C 16/277 (2013.01); C23C 16/511 (2013.01); C23C 16/56 (2013.01); C23C 28/322 (2013.01); C23C 28/34 (2013.01); C03C 2217/75 (2013.01); C03C 2218/112 (2013.01); C03C 2218/153 (2013.01);
Abstract

A method for creating a hydrophilic antimicrobial diamond coating on a silicon or glass surface includes providing a silicon or glass surface, creating a second surface by seeding a plurality of nanodiamond particles on the silicon or glass surface by microwave plasma chemical vapor deposition (MPCVD), and forming a silver nitrate and hydroxylamine solution. A third surface may be created by seeding a plurality of silver nanoparticles onto the second surface by spraying the silver nitrate and hydroxylamine solution onto the second surface and maintaining the silver nitrate and hydroxylamine solution on the second surface for a predetermined time. The third surface may then be exposed to an oxygen plasma treatment.


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