The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Aug. 29, 2019
Applicants:

Thales Solutions Asia Pte Ltd, Singapore, SG;

Centre National DE LA Recherche Scientifique, Paris, FR;

Nanyang Technological University, Singapore, SG;

Université DE Lille, Lille, FR;

Inventors:

Jianxiong Wang, Singapore, SG;

Philippe Coquet, Singapore, SG;

Beng Kang Tay, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B82Y 40/00 (2011.01); H10K 71/18 (2023.01); H10K 85/20 (2023.01);
U.S. Cl.
CPC ...
B81C 1/00031 (2013.01); B81C 1/00111 (2013.01); H10K 71/18 (2023.02); H10K 85/221 (2023.02); B82Y 40/00 (2013.01);
Abstract

A nanostructure transfer method is provided. The method includes providing a first substrate () having thereon a plurality of nanostructures (), the nanostructures () extending away from the first substrate (). A solder material () is deposited on distal ends of the nanostructures (). A second substrate () having thereon a first metal layer () is provided. The solder material () is bonded to the first metal layer (), thereby attaching the nanostructures () to the second substrate (). The attached nanostructures () are then released from the first substrate ().


Find Patent Forward Citations

Loading…