The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Jan. 25, 2023
Applicant:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

Hyun Myung, Daejeon, KR;

Euigon Jung, Daejeon, KR;

Wonho Song, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B60W 60/00 (2020.01);
U.S. Cl.
CPC ...
B60W 60/0011 (2020.02); B60W 60/0015 (2020.02); B60W 2554/20 (2020.02); B60W 2554/40 (2020.02); B60W 2556/40 (2020.02);
Abstract

Disclosed is a high-definition (HD) map-based local path planning method and apparatus for dynamic and static object avoidance. An HD map-based local path planning method for dynamic and static object avoidance performed by a computer device includes verifying a position on a global path by parameterizing the global path using an arc length; generating a path candidate group based on the global path; and selecting an optimal path as a path having a smallest cost function related to a global path following from the path candidate group. The cost function includes a global-path-following cost for selecting a path candidate group having a smallest lateral offset from the global path.


Find Patent Forward Citations

Myung, Hyun. (2025). High-definition map-based local path planning method and apparatus for dynamic and static obstacle avoidance (U.S. Patent No. 12325445). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12325445

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