The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Dec. 14, 2020
Applicant:

AR Packaging Systems Ab, Lund, SE;

Inventor:

Per Hagelqvist, Lund, SE;

Assignee:

GPI Systems AB, Lund, SE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65B 51/14 (2006.01); B29C 65/00 (2006.01); B65B 7/28 (2006.01); B29L 31/00 (2006.01); B29L 31/26 (2006.01);
U.S. Cl.
CPC ...
B29C 66/8145 (2013.01); B29C 66/5346 (2013.01); B29L 2031/26 (2013.01); B29L 2031/712 (2013.01);
Abstract

A radially expansible press plunger including a base plate and a first plunger skirt. A circumferential edge portion of the first plunger skirt is arranged at a guiding surface of the base plate and being arranged radially inward of the circumferential edge of the bottom surface. The first plunger skirt is resiliently transformable between an unexpanded state and a radially expanded state. The expansible press plunger further comprises a second plunger skirt having a plunger skirt side wall with a circumferential edge portion at a bottom end of the second plunger skirt and being arranged radially outward of the circumferential edge portion of the first plunger skirt. The second plunger skirt is resiliently transformable between an unexpanded state and a radially expanded state under influence from the circumferential edge portion of the first plunger skirt.


Find Patent Forward Citations

Loading…