The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Sep. 16, 2021
Laser Systems & Solutions of Europe, Gennevilliers, FR;
Fulvio Mazzamuto, Gennevilliers, FR;
Sylvain Perrot, Gennevilliers, FR;
Nabil Douri, Gennevilliers, FR;
Guillaume Vincent Thebault, Gennevilliers, FR;
Karim Mikaël Huet, Gennevilliers, FR;
Guillermo Abraham Gonzalez Trujillo, Gennevilliers, FR;
LASER SYSTEMS & SOLUTIONS OF EUROPE, Gennevilliers, FR;
Abstract
A method for uniformly irradiating a frame of a processed substrate, the processed substrate including a plurality of frames, two consecutive frames being separated by an intermediate zone, the method includes steps of: determining an initial position of the processed substrate using a detecting unit; comparing the detected initial position with a first predetermined position associated with a first frame of the processed substrate; irradiating the first frame of the processed substrate by an irradiation beam emitted by a source unit and scanned by a scanning unit based on the first predetermined position, the irradiation beam being adapted to cover uniformly the whole first frame. A system for uniformly irradiating a frame of a processed substrate is also described.