The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Sep. 12, 2019
Hitachi, Ltd., Tokyo, JP;
Takayoshi Seki, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
The ion source includes a microwave power supply provided outside main magnetic poles, a radiofrequency waveguide and an antenna configured to introduce a microwave generated by the microwave power supply to a region to which a magnetic field generated by the main magnetic poles is applied, and a magnetic field generation unit provided inside a hole provided in a part of the main magnetic poles and configured to generate a magnetic field in a direction opposite to that of the magnetic field generated by the main magnetic poles. Plasma is generated inside the main magnetic poles by a magnetic field generated by applying the magnetic field generated by the magnetic field generation unit in the opposite direction to the main magnetic field decreased according to a diameter of the hole and the microwave introduced by the radiofrequency waveguide and the antenna.