The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Jun. 30, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Maolin Long, Santa Clara, CA (US);
Neema Rastgar, San Jose, CA (US);
Alexander Miller Paterson, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32871 (2013.01); H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01J 37/32119 (2013.01); H01J 37/32449 (2013.01); H01J 37/32651 (2013.01); H01L 21/67069 (2013.01); H01J 2237/334 (2013.01); H01L 21/6831 (2013.01);
Abstract
A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.