The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Jul. 01, 2020
Institut Für Nanophotonik Goettingen E.v., Goettingen, DE;
Alexander Egner, Goettingen, DE;
Claudia Geisler, Bad Gandersheim, DE;
Francesco Rocca, Goettingen, DE;
INSTITUT FÜR NANOPHOTONIK GÖTTINGEN E.V., Göttingen, DE;
Abstract
For correcting aberration-induced imaging errors of an optical system which includes an objective () and an adaptive optic (), light () and a sample () are selected such that the light (), in acting upon the sample (), reduces a measurement signal () from the sample (), wherein a relative variation of the measurement signal () depends on the intensity of the light (). The measurement signal () from a focal area of the optical system in the sample () is registered over a first and a later second period of time () to determine a first measurement value and a second measurement value. Over a third period of time () which overlaps with the first and/or the second period of time, the light () is focused into the focal area by means of the optical system. A measure value for the relative variation of the measurement signal () is determined from the first and the second measurement values and used in controlling the adaptive optic () as a metric to be optimized.