The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2025

Filed:

Jan. 15, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Durairaj Baskaran, Bridgewater, NJ (US);

Victor Monreal, Breinigsville, PA (US);

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 53/00 (2006.01); C08F 297/02 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); G03F 7/36 (2006.01); H01L 21/027 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
C08L 53/00 (2013.01); C08F 297/026 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/36 (2013.01); H01L 21/0271 (2013.01); H01L 21/3065 (2013.01); H01L 21/308 (2013.01); C08L 2205/025 (2013.01); C08L 2205/03 (2013.01);
Abstract

The present invention relates to a composition comprising components a), b) and c). The component a) is a block copolymer or a blend of block copolymers. The component b) is a low Tadditive selected from the group consisting of an oligo random oligo random copolymer b-1), an oligo diblock copolymer b-2), an oligo diblock copolymer b-3) and a mixture of at least two of these. The component c) is a is a spin casting organic solvent. The invention also pertains to the use of said compositions in directed self-assembly. The invention further pertains to the novel oligo diblock copolymer b-2) which is an oligo diblock copolymer of block A-b) and block B-b), wherein block A-b) is a random copolymer of repeat units having structures (III), and (IV and block B-b) is a random copolymer of repeat units having structures (V), and (VI).


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