The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Mar. 30, 2023
Up Chemical Co., Ltd., Pyeongtaek-si, KR;
Yun Tae Kim, Pyeongtaek-si, KR;
Won Seok Han, Pyeongtaek-si, KR;
Yoon A Park, Pyeongtaek-si, KR;
Wonyong Koh, Pyeongtaek-si, KR;
UP CHEMICAL CO., LTD., Pyeongtaek-si, KR;
Abstract
A compound represented by chemical formula 4 is reacted with an alkali metal carbonate salt represented by chemical formula 5 and 1,5-hexadiene, in an organic solvent, and by controlling a compound represented by chemical formula 1, a compound represented by chemical formula 2 and a compound represented by chemical formula 3 to within a specific content range, a ruthenium precursor composition that is thermally very stable is provided in an economical and efficient manner. When a ruthenium-containing film is formed by using the ruthenium precursor composition, changes in the composition of the ruthenium precursor composition is prevented during a process in which the ruthenium precursor composition is vaporized, or even thereafter, production of by-products such as pyrolysis substances or the like is minimized, and accordingly, deposition results having stable and constant properties is obtained in a semiconductor process.