The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Nov. 09, 2022
Applicant:
Asmpt Smt Singapore Pte. Ltd., Singapore, SG;
Inventors:
Mark Alfred Whitmore, Broadstone, GB;
Jeffrey David Schake, Apalachin, NY (US);
Assignee:
ASMPT SMT SINGAPORE PTE. LTD., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F 15/44 (2006.01); B41F 23/04 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
B41F 15/44 (2013.01); B41F 23/0456 (2013.01); H01L 24/27 (2013.01); H01L 24/83 (2013.01); H01L 2224/2732 (2013.01); H01L 2224/83192 (2013.01);
Abstract
A method for producing a flat feature on a substrate, comprises the steps of printing a deposit of print medium onto the substrate, the printed deposit comprising an upper surface, modifying the upper surface of the printed deposit, for example by partially drying the printed deposit, and levelling the modified deposit to produce a flat feature.
Quick Actions:
Whitmore, Mark. (2025). Deposit levelling (U.S. Patent No. 12319049). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12319049
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile