The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Dec. 09, 2021
Schott Ag, Mainz, DE;
Andreas Ortner, Gau-Algesheim, DE;
Fabian Wagner, Mainz, DE;
Markus Heiss-Chouquet, Bischofsheim, DE;
Annika Hörberg, Mainz, DE;
Michael Drisch, Mainz, DE;
Vanessa Glässer, Mainz, DE;
Lukas Walter, Oestrich-Winkel, DE;
Andreas Koglbauer, Trebur, DE;
Lars Müller, Wiesbaden, DE;
David Sohr, Mainz, DE;
Bernd Hoppe, Ingelheim, DE;
Michael Kluge, Offenbach am Main, DE;
SCHOTT AG, Mainz, DE;
Abstract
A method of structuring a glass element having a first side face and a second side face is provided. The method includes the steps of: producing a filament-shaped flaw in the glass element with a pulsed laser beam along a focus line; etching to remove glass in the filament-shaped flaw to form a wall extending from the first side face towards the second side face, the wall having a boundary line that is tapered at a vertex between the wall and the first side face with a taper angle with respect to a perpendicular of the first side face; and adjusting the taper angle by controlling a feature of the focus line. The feature is selected from a group consisting of a position of the focus line, a length of the focus line, an intensity distribution of the focus line, and any combinations thereof.