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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12317710 B1

PDFFull Text
Date of Patent:
May. 27, 2025

Filed:

Dec. 19, 2023

Method of determining the spread of an organic layer in an oled

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Ki Ho Bang, Hwaseong-si, KR;

Eun Hye Kim, Namyangju-si, KR;

Won Suk Choi, Seoul, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:

CANTOR COLBURN LLP

Primary Examiner:

Peter Bradford

Int. Cl.
CPC ...
H01L 27/32 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01); H10K 50/844 (2023.01); H10K 59/122 (2023.01); H10K 59/131 (2023.01); H10K 71/00 (2023.01); H10K 59/12 (2023.01);
U.S. Cl.
CPC ...
H10K 59/131 (2023.02); H10K 50/844 (2023.02); H10K 59/122 (2023.02); H10K 71/00 (2023.02); H10K 59/1201 (2023.02);
Abstract

A display apparatus includes a base substrate on which a display area and a non-display area are defined, a first via insulating layer on the base substrate, a first power supply wire in the non-display area on the first via insulating layer, a second power supply wire in the non-display area on the first via insulating layer spaced apart from the first power supply wire, a first dam on the base substrate, overlapping the first and second power supply wires, and extending along the non-display area, a first stacked structure on the first via insulating layer between the first dam and the display area, and having a height less than a height of the first dam, and an organic layer on the first stacked structure and the first dam to overlap a substantially entire portion of the first stacked structure and at least a portion of the first dam.

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