The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Aug. 05, 2022
Applicant:

Auo Corporation, Hsinchu, TW;

Inventor:

Yang-Shun Fan, Hsinchu, TW;

Assignee:

AUO Corporation, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 86/60 (2025.01); H01L 21/02 (2006.01); H10D 30/47 (2025.01); H10D 30/67 (2025.01); H10D 62/80 (2025.01); H10D 86/01 (2025.01); H10D 86/40 (2025.01); H10D 99/00 (2025.01);
U.S. Cl.
CPC ...
H10D 86/60 (2025.01); H01L 21/02565 (2013.01); H10D 30/475 (2025.01); H10D 30/6734 (2025.01); H10D 30/6739 (2025.01); H10D 30/6755 (2025.01); H10D 62/80 (2025.01); H10D 86/0221 (2025.01); H10D 86/423 (2025.01); H10D 86/427 (2025.01); H10D 99/00 (2025.01);
Abstract

A semiconductor device includes a substrate, a first thin-film transistor, and a second thin-film transistor. The first and second thin-film transistors are disposed on the substrate. The first thin-film transistor includes stacked first and second metal oxide layers. An oxygen concentration of the first metal oxide layer is less than an oxygen concentration of the second metal oxide layer, and a thickness of the second metal oxide layer is less than a thickness of the first metal oxide layer. A two-dimensional electron gas is located at an interface between the first and second metal oxide layers. The second thin-film transistor is electrically connected to the first thin-film transistor. The second thin-film transistor includes a third metal oxide layer. The second and third metal oxide layers belong to a same patterned layer.


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