The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Mar. 07, 2022
Applicant:

Jpmorgan Chase Bank, N.a., New York, NY (US);

Inventors:

Ryan Eavy, Chicago, IL (US);

Olisa Obinna Okpoko, Brighton, MI (US);

Assignee:

JPMORGAN CHASE BANK, N.A., New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 30/333 (2020.01); G06F 18/214 (2023.01); G06F 30/337 (2020.01); G06F 30/398 (2020.01); G06F 40/20 (2020.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06F 30/333 (2020.01); G06F 18/214 (2023.01); G06F 30/337 (2020.01); G06F 30/398 (2020.01); G06F 40/20 (2020.01); G06N 20/00 (2019.01);
Abstract

Systems and methods for identifying and remediating architecture design defects are disclosed. In one aspect, a method includes generating a new architecture graph pattern based on an architecture design document of an evaluated architecture; determining a model graph pattern, wherein a shape of the model graph pattern is similar to a shape of the architecture graph pattern; determining, based on a comparison of the shape of the model graph pattern with the shape of the new architecture graph pattern, that the new architecture graph pattern includes a design defect; generating, based on the shape of the model graph pattern, a remediated graph pattern; and determining, based on the differences between the remediated graph pattern and the new architecture graph pattern, a suggested remedial change to the architecture design document.


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