The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Mar. 30, 2021
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Xingzhou Tu, Redmond, WA (US);

Yun-Han Lee, Redmond, WA (US);

Mengfei Wang, Kirkland, WA (US);

Stephen Choi, Seattle, WA (US);

Lu Lu, Kirkland, WA (US);

Assignee:

Meta Platforms Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/04 (2006.01); G02B 5/18 (2006.01); G02F 1/1337 (2006.01); G03H 1/02 (2006.01);
U.S. Cl.
CPC ...
G03H 1/041 (2013.01); G02B 5/1833 (2013.01); G02F 1/1337 (2013.01); G03H 2001/0216 (2013.01); G03H 2001/0441 (2013.01);
Abstract

A system includes a light outputting element configured to output a first beam propagating toward a beam interference zone from a first side of the beam interference zone. The system also includes a reflective assembly configured to reflect the first beam back as a second beam propagating toward the beam interference zone from a second side of the beam interference zone. The first beam and the second beam interfere with one another within the beam interference zone to generate a polarization interference pattern.


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