The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Jun. 21, 2021
Applicant:

National Research Council of Canada, Ottawa, CA;

Inventors:

Zhigang Sun, Greenfield Park, CA;

Kuo-Ting Wu, Brossard, CA;

Cheng Hu, Richmond, CA;

Silvio Elton Krüger, Brossard, CA;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B02C 17/18 (2006.01); B02C 17/22 (2006.01); G01N 29/24 (2006.01); G01N 29/34 (2006.01);
U.S. Cl.
CPC ...
G01N 29/2437 (2013.01); B02C 17/1805 (2013.01); B02C 17/22 (2013.01); G01N 29/348 (2013.01); B02C 2210/01 (2013.01); G01N 2291/0258 (2013.01); G01N 2291/02854 (2013.01);
Abstract

A method of monitoring both liner wear and charge impact in an industrial mill uses a sensor mounted on an elongated element deployed through a shell into a liner of the mill. The elongated element wears at a same rate as the liner under conditions within the shell. Liner wear is related to a reduction in length of the elongated element as measured by travel time of an ultrasound wave, while location and strength of charge impact is related to change in amplitude of vibrations caused by the charge impact. Liner wear measurement can be improved by using shear ultrasound waves instead of conventional longitudinal ultrasound waves. A mill monitoring apparatus has a means for acquiring ultrasonic waves and audible sound waves using the same digitizer; a means for determining the angular position of the monitoring apparatus; and a means for supplying electric power to the apparatus.


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