The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Jan. 25, 2021
Applicant:

Free Form Fibers, Llc, Saratoga Springs, NY (US);

Inventors:

Shay L. Harrison, East Schodack, NY (US);

John L Schneiter, Cohoes, NY (US);

Joseph Pegna, Saratoga Springs, NY (US);

Ram K. Goduguchinta, Ballston Lake, NY (US);

Kirk L Williams, Saratoga Springs, NY (US);

Erik G. Vaaler, Redwood City, CA (US);

Assignee:

Free Form Fibers, LLC, Saratoga Springs, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/32 (2006.01); C01B 32/963 (2017.01); C04B 35/565 (2006.01); C04B 35/626 (2006.01); C23C 16/48 (2006.01); C23C 16/56 (2006.01); G21C 3/26 (2006.01);
U.S. Cl.
CPC ...
C23C 16/325 (2013.01); C01B 32/963 (2017.08); C04B 35/565 (2013.01); C04B 35/6261 (2013.01); C04B 35/62695 (2013.01); C23C 16/483 (2013.01); C23C 16/56 (2013.01); G21C 3/26 (2013.01);
Abstract

A method of forming a high purity granular material, such as silicon carbide powder. Precursors are added to a reactor; at least part of a fiber is formed in the reactor from the precursors using chemical deposition interacting with said precursors; and the granular material is then formed from the fiber. In one aspect, the chemical deposition may include laser induced chemical vapor deposition. The granular material may be formed by grinding or milling the fiber into the granular material, e.g., ball milling the fiber. In one example, silicon carbide powder having greater than 90% beta crystalline phase purity and less than 0.25% oxygen contamination can be obtained.


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