The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Sep. 14, 2021
Xi'an Jiaotong University, Xi'an, CN;
Xi'an Jiaotong University, Xi'an, CN;
Abstract
A method for preparing fluorescent carbon quantum dots by using gas-liquid two-phase plasma is provided, which relates to the field of fluorescent carbon quantum technology. On the basis of liquid phase plasma, an inert gas is introduced to generate plasma by a gas-liquid two-phase discharge method. The introduction of inert gas facilitates the formation of discharge channels, reduces the difficulty of product synthesis, improves mass transfer rates of active particles, helps to improve synthesis rates of carbon nano-products, increases discharge contact area and enhances discharge stability. A high reaction efficiency and a short time consumption can be realized. A pulsed power supply is adopted for discharge, which has lower energy consumption compared with the direct current discharge. Moreover, the process is simple, raw materials are easy to obtain, and there is no need for catalysts, strong oxidants or strong corrosives, so the purity of the product maybe higher.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile