The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Mar. 14, 2022
Applicant:

Murata Manufacturing Co., Ltd., Nagaokakyo, JP;

Inventor:

Akira Konno, Helsinki, FI;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 3/00 (2006.01); G01P 15/125 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0051 (2013.01); G01P 15/125 (2013.01); B81B 2201/0235 (2013.01); B81B 2203/0136 (2013.01); B81B 2203/04 (2013.01);
Abstract

The present invention relates micro-electromechanical systems (MEMS); in particular to a comb channel structure for decreasing damping asymmetry of comb electrodes used to measure movement of components with MEMS devices. The channel is formed by a series of recesses formed in the comb fingers of the comb electrodes, or in the cap or handle wafer adjacent to the comb fingers. The channel increases the cross sectional area of the path through which gas can move into or out of the space between the comb electrodes as the comb electrodes move with respect to one another. Thus, when there is a damping asymmetry caused by a difference in the distance between the comb electrode and the cap wafer, and the comb electrode and handle wafer, the channel is employed on the side of the comb electrode with the smaller distance to the adjacent wafer to reduce the damping asymmetry.


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Konno, Akira. (2025). Channel for decreasing damping asymmetry (U.S. Patent No. 12312235). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12312235

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