The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2025

Filed:

Aug. 29, 2024
Applicant:

China University of Geosciences (Wuhan), Hubei, CN;

Inventors:

Haihao Guo, Wuhan, CN;

Jinlong Li, Wuhan, CN;

Xinshui Wang, Wuhan, CN;

Zaicong Wang, Wuhan, CN;

Yufei Zhao, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
B01J 19/0013 (2013.01); B01J 2219/00051 (2013.01); B01J 2219/00162 (2013.01);
Abstract

Disclosed is device and method for controlling pressure of high-temperature and high-pressure reactor. The device includes an automatic pressurizing unit, a manual pressurizing unit, a temperature boosting and pressure boosting control unit, and a temperature and pressure control panel. A first valve, a first pressure gauge, a second valve, and a second pressure gauge are successively provided between the automatic pressurizing unit and the manual pressurizing unit. A pipeline where the temperature boosting and pressure boosting control unit is located is connected between the first pressure gauge and the second valve by a tee. The temperature and pressure control panel is connected to the automatic pressurizing unit, the manual pressurizing unit, and the temperature boosting and pressure boosting control unit by a wire.


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