The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Feb. 08, 2022
Applicant:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

Yeonsik Jung, Daejeon, KR;

Kyeongmin Song, Daejeon, KR;

Moohyun Kim, Daejeon, KR;

Tae Won Nam, Daejeon, KR;

Hyunjin Cho, Daejeon, KR;

Hongjoo Shin, Daejeon, KR;

Geon Yeong Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 50/115 (2023.01); B82Y 40/00 (2011.01); H10K 71/13 (2023.01); H10K 71/15 (2023.01); H10K 77/10 (2023.01); H10K 85/10 (2023.01); B82Y 20/00 (2011.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
H10K 71/135 (2023.02); B82Y 40/00 (2013.01); H10K 50/115 (2023.02); H10K 71/15 (2023.02); H10K 77/111 (2023.02); H10K 85/146 (2023.02); B82Y 20/00 (2013.01); H10K 2102/351 (2023.02);
Abstract

The present disclosure relates to a method of printing multi-nanoparticles using evaporation dynamics and surface energy control, the method includes: a step S1 of forming a pattern on a surface of a substrate by irradiating ultraviolet rays to a portion of the surface through a photomask; a step S2 of coating the substrate with a solution containing nanoparticles; and a step S3 of lowering surface energy of the coated nanoparticles.


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