The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Jun. 30, 2022
Applicant:
Avalon Holographics Inc., St. John's, CA;
Inventors:
Assignee:
AVALON HOLOGRAPHICS INC., ST. JOHN'S, CA;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10K 50/125 (2023.01); H10K 50/12 (2023.01); H10K 59/30 (2023.01); H10K 71/16 (2023.01); H10K 71/20 (2023.01); H10K 85/10 (2023.01);
U.S. Cl.
CPC ...
H10K 50/125 (2023.02); H10K 50/12 (2023.02); H10K 59/30 (2023.02); H10K 71/166 (2023.02); H10K 71/233 (2023.02); H10K 85/10 (2023.02);
Abstract
A trilayer resist system design and method for patterning organic devices including organic light emitting diode (OLED) devices suited for high-definition light field displays. The trilayer resist system is comprised of a fluoropolymer base layer, an inorganic transfer layer and a top positive-type photoresist layer that protects organics formed upon a substrate from damage resulting from the radiation, developers and solvents used in traditional photolithography techniques and thereby resulting in a high-resolution multi-colored OLED array.