The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Nov. 21, 2022
Applicant:

Shanghai Institute of Technical Physics Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Fang Wang, Shanghai, CN;

Fuxing Dai, Shanghai, CN;

Weida Hu, Shanghai, CN;

Xiaoshuang Chen, Shanghai, CN;

Wei Lu, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10F 30/24 (2025.01); H10F 71/00 (2025.01); H10F 77/12 (2025.01); H10F 77/20 (2025.01);
U.S. Cl.
CPC ...
H10F 30/24 (2025.01); H10F 71/00 (2025.01); H10F 77/12 (2025.01); H10F 77/206 (2025.01);
Abstract

The present disclosure relates to an infrared photodetector based on a van der waals heterostructure and a preparation method thereof. The infrared photodetector comprises a fully depleted van der waals heterostructure. The fully depleted van der waals heterostructure comprises a first n-type two-dimensional semiconductor layer, a p-type two-dimensional semiconductor layer, and a second n-type two-dimensional semiconductor layer which are sequentially provided from bottom to top. A fully depleted built-in electric field is formed by means of a sandwich structure including the first n-type two-dimensional semiconductor layer, the p-type two-dimensional semiconductor layer and the second n-type two-dimensional semiconductor layer, which can improve the light absorption efficiency while reducing the dark current of a device, and the separation rate and collection efficiency of photo-induced carriers are accelerated.


Find Patent Forward Citations

Loading…