The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Aug. 16, 2022
Applicant:

Seoul National University R&db Foundation, Seoul, KR;

Inventors:

Jong-Ho Lee, Seoul, KR;

Young-Tak Seo, Seongnam-si, KR;

Soochang Lee, Seoul, KR;

Seongbin Oh, Seoul, KR;

Jangsaeng Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); G06N 3/063 (2023.01); G11C 16/08 (2006.01); H10B 43/35 (2023.01); H10B 43/40 (2023.01); H10B 51/20 (2023.01); H10B 51/40 (2023.01); G11C 16/04 (2006.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); G06N 3/063 (2013.01); G11C 16/08 (2013.01); H10B 43/35 (2023.02); H10B 43/40 (2023.02); H10B 51/20 (2023.02); H10B 51/40 (2023.02); G11C 16/0483 (2013.01);
Abstract

Provided is a 3D capacitor stack and a method for manufacturing the same. The 3D capacitor stack comprises: a drain line electrode having a pillar shape provided in a vertical direction on a substrate surface; a plurality of first insulating layers positioned in first region of an outer circumferential surface of the drain line electrode; a plurality of drains positioned in second regions of an outer circumferential surface of the drain line electrode; a plurality of insulator stacks positioned on side surfaces of the drains; and a plurality of word lines positioned on side surfaces of the insulator stacks. The word lines surrounded by the insulator stacks are positioned on the side of the drains, first insulating layers and drains are alternately stacked on the outer circumferential surface of the drain line electrode, and the word lines surrounded by the insulator stacks and the first insulating layers are alternately stacked; the drain, the word line and the insulator stack constitute a capacitor device, and the capacitor devices electrically isolated from each other by the first insulating layers are vertically stacked to form a stack structure.


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