The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Aug. 18, 2022
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Tomasz Lukasz Religa, Seattle, WA (US);
Warren Aldred, Redmond, WA (US);
Si-Qing Chen, Bellevue, WA (US);
Zhang Li, Sammamish, WA (US);
Jesse Alexander Freitas, Seattle, WA (US);
Tao Ge, Beijing, CN;
Huitian Jiao, Snoqualmie, WA (US);
Max Wang, Seattle, WA (US);
Xun Wang, Amherst, MA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
A data processing system obtains source textual content associated with a first writing style and target textual content associated with a second writing style and provides the source textual content as an input to a first machine learning model which analyzes the source content to determine the first writing style of the first textual content. The system provides an indication of the first writing style and the target textual content as an input to a second machine learning model which analyzes the target textual content and rewrites the target textual content according to the first writing style to output updated target textual content rewritten according to the first writing style. Some implementations utilize a single model trained to receive the source textual content, the target textual content, to determine the writing style of the source textual content and rewrite the target textual content according to the first writing style.