The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

May. 03, 2023
Applicant:

Digilens Inc., Sunnyvale, CA (US);

Inventors:

Jonathan David Waldern, Diablo, CA (US);

Milan Momcilo Popovich, Leicester, GB;

Alastair John Grant, San Jose, CA (US);

Assignee:

DigiLens Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/20 (2006.01); G02B 6/00 (2006.01); G02B 27/00 (2006.01); G02B 27/01 (2006.01); G03H 1/02 (2006.01); G03H 1/04 (2006.01);
U.S. Cl.
CPC ...
G03H 1/20 (2013.01); G02B 6/00 (2013.01); G02B 27/0081 (2013.01); G02B 27/0172 (2013.01); G03H 1/0248 (2013.01); G03H 1/0408 (2013.01); G02B 27/0093 (2013.01); G03H 2223/16 (2013.01); G03H 2260/00 (2013.01);
Abstract

Mastering systems and methods of fabricating waveguides and waveguide devices using such mastering systems are described. Mastering systems for fabricating holographic waveguides can include using a master to control the application of energy (e.g. a laser, light, or magnetic beam) onto a liquid crystal substrate to fabricate a holographic waveguide into the liquid crystal substrate. Mastering systems for fabricating holographic waveguides in accordance with embodiments of the invention can include a variety of features. These features include, but are not limited to: chirp for single input beam copy (near i.e. hybrid contact copy), dual chirped gratings (for input and output), zero order grating for transmittance control, alignment reference gratings, 3:1 construction, position adjustment tooling to enable rapid alignment, optimization of lens and window thickness for multiple RKVs simultaneously, and avoidance of other orders and crossover of the diffraction beam.


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