The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Dec. 27, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Yun Ho Choi, Osan-si, KR;

Seung Won Kim, Yongin-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01);
Abstract

Disclosed is a photo mask stage unit performing alignment on a photo mask, the photo mask stage unit including: an aligning member for aligning the photo mask so that the photo mask is positioned in a proper position; and guide members for supporting edges of the photo mask and guiding the photo mask to the proper position, in which the aligning member pushes the photo mask in a diagonal direction.


Find Patent Forward Citations

Choi, Yun. (2025). Photo mask stage unit and photo mask stocker including the same (U.S. Patent No. 12306549). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12306549

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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