The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

May. 10, 2024
Applicants:

Japan Display Inc., Tokyo, JP;

Osaka University, Suita, JP;

Inventors:

Koichi Igeta, Tokyo, JP;

Ayaka Higuchi, Tokyo, JP;

Junji Kobashi, Tokyo, JP;

Yasushi Tomioka, Tokyo, JP;

Shinichiro Oka, Tokyo, JP;

Hiroyuki Yoshida, Suita, JP;

Assignees:

Japan Display Inc., Tokyo, JP;

Osaka University, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133788 (2013.01); G02F 1/133509 (2013.01); G02F 1/13355 (2021.01);
Abstract

According to one embodiment, an alignment processing device includes a light source, a polarizing beam splitter, a first optical system, a second optical system, a first retardation film, a second retardation film, a moving mechanism configured to move a processing substrate in which a thin film is formed, and a controller. Interfering light is formed in an exposure area by first circularly polarized light and second circularly polarized light. The controller performs control so as to repeat a process of exposing part of an area of the thin film by the interfering light and a process of moving the processing substrate.


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