The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Mar. 25, 2022
Fujifilm Corporation, Tokyo, JP;
Katsumi Sasata, Minamiashigara, JP;
Akiko Watano, Minamiashigara, JP;
Hiroshi Sato, Minamiashigara, JP;
Yukito Saitoh, Minamiashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a method of manufacturing an optical element in which aligning properties of an alignment pattern in a photo-alignment film is improved such that alignment defects of a liquid crystal compound in a liquid crystal layer can be suppressed. The method of manufacturing an optical element includes: an exposure step of performing interference exposure to a surface of a photo-alignment film including a photo-alignment material to form, on the photo-alignment film, an alignment pattern in which a direction of an optical axis derived from a liquid crystal compound changes while continuously rotating in at least one in-plane direction; and a liquid crystal layer forming step of applying a liquid crystal composition including a liquid crystal compound to the photo-alignment film where the alignment pattern is formed to form a liquid crystal layer, in which the photo-alignment material includes an azo compound, and the exposure step is performed in an environment having a relative humidity of 50% or less.