The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Nov. 11, 2019
Applicant:

Semibooster Co., Ltd., Gyeongsangbuk-do, KR;

Inventors:

Seung Hun Lee, Daegu, KR;

Seung Hyun Lee, Daegu, KR;

Assignee:

SEMIBOOSTER CO., LTD., Gyeongsangbuk-do, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2024.01);
U.S. Cl.
CPC ...
G01N 15/06 (2013.01); G01N 2015/0687 (2013.01);
Abstract

The present invention relates to a method of determining the concentration of silicon based on the solubility of silicon in a phosphoric acid solution to determine the concentration of silicon generated in the process of etching silicon nitride. The silicon concentration determination method can determine the concentration of only the silicon that is generated during a process of etching silicon nitride using a phosphoric acid solution. The method optically determines the concentration of a silicon compound that is added to increase selectivity.


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