The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Jan. 02, 2024
Applicant:

City University of Hong Kong, Kowloon, HK;

Inventors:

Thuc Hue Ly, Kowloon, HK;

Ping Man, Kowloon, HK;

Ka Ho Leung, Kowloon, HK;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/30 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4485 (2013.01); C23C 16/305 (2013.01); C23C 16/4408 (2013.01);
Abstract

Disclosed herein is a method of producing a substrate having a single-layer transition metal selenide (TMS) nanoflakes deposited thereon. The method is characterized in not using hydrogen as a reducing agent during the deposition of monolayer TMS nanoflakes on the substrate. Such substrates may serve as an optic, an electronic device, a mechanic, a sensor etc.


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