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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12305080 B1

PDFFull Text
Date of Patent:
May. 20, 2025

Filed:

Mar. 02, 2020

Slurry composition for polishing silicon oxide film, and polishing method using same

Applicant:

Young Chang Chemical Co., Ltd, Gyeongsangbuk-do, KR;

Inventors:

Seung Hun Lee, Daegu, KR;

Seung Hyun Lee, Daegu, KR;

Seong Hwan Kim, Daegu, KR;

Assignee:

YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-Do, KR;

Attorneys:

NKL Law

Jae Youn Kim

Primary Examiner:

Anthony J Green

Assistant Examiner:

Marites A Guino-O Uzzle

Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09K 3/14 (2006.01); H01L 21/304 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1454 (2013.01); H01L 21/304 (2013.01); C09K 3/1409 (2013.01); C09K 3/1445 (2013.01); C09K 3/1463 (2013.01); H01L 21/31051 (2013.01); H01L 21/31053 (2013.01);
Abstract

Proposed are a CMP slurry composition and a polishing method using the same. The CMP slurry composition in which the zeta potential of colloidal silica serving as an abrasive is properly controlled and metal impurities are removed from the colloidal silica and to a polishing method using the same. The CMP slurry composition is configured to improve a polishing performance for a silicon oxide film, minimize scratches on a finished surface, and to enable adjustment of a content ratio of an abrasive and an additive in the composition, thereby enabling adjustment of a polishing selectivity among a silicon oxide film, a silicon nitride film, and a polysilicon film.

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Lee, Seung. (2025). Slurry composition for polishing silicon oxide film, and polishing method using same (U.S. Patent No. 12305080). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12305080

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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