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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12304875 B1

PDFFull Text
Date of Patent:
May. 20, 2025

Filed:

Mar. 07, 2023

Plasma-resistant member

Applicant:

Toto Ltd., Kitakyushu, JP;

Inventors:

Junichi Iwasawa, Fukuoka-ken, JP;

Toshihiro Aoshima, Fukuoka-ken, JP;

Assignee:

Toto Ltd., Fukuoka, JP;

Attorneys:

Carrier, Shende & Associates P.C.

Joseph P. Carrier

Fulchand P. Shende

Primary Examiner:

Laura A Auer

Int. Cl.
CPC ...
C04B 35/505 (2006.01); C04B 35/622 (2006.01); C04B 41/00 (2006.01); C04B 41/50 (2006.01); C04B 41/87 (2006.01); C23C 4/12 (2016.01); C23C 16/44 (2006.01); C23C 24/04 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C04B 41/87 (2013.01); C04B 35/505 (2013.01); C04B 35/62222 (2013.01); C04B 41/009 (2013.01); C04B 41/5045 (2013.01); C23C 4/12 (2013.01); C23C 16/4404 (2013.01); C23C 24/04 (2013.01); H01L 21/6833 (2013.01); H01L 21/68757 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3225 (2013.01); C04B 2235/781 (2013.01); C04B 2235/785 (2013.01); C04B 2235/963 (2013.01); C04B 2237/066 (2013.01); C04B 2237/343 (2013.01); C04B 2237/592 (2013.01); Y02T 50/60 (2013.01);
Abstract

According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

Find Patent Forward Citations

Iwasawa, Junichi. (2025). Plasma-resistant member (U.S. Patent No. 12304875). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12304875

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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