The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Oct. 14, 2020
Seiko Epson Corporation, Tokyo, JP;
Satoshi Yamazaki, Nagano, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A three-dimensional shaped article manufacturing method by using a flow rate adjustment mechanism to control a discharge start and a discharge stop of a shaping material discharged from a discharge unit and stacking the shaping material includes generating intermediate data including a partial route that is a route along which the discharge unit moves while continuously discharging the shaping material, and a moving speed of the discharge unit on the partial route, generating shaping data based on the intermediate data, and controlling the discharge unit according to the shaping data and shaping the three-dimensional shaped article. The moving speed is changed such that a control time required to control the flow rate adjustment mechanism on the partial route is equal to or shorter than a moving time for the discharge unit to move along the partial route when the control time is longer than the moving time.