The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Mar. 09, 2021
Ordos Yuansheng Optoelectronics Co., Ltd., Ordos, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Liang Tang, Beijing, CN;
Liangliang Liu, Beijing, CN;
Liman Peng, Beijing, CN;
Yan Wu, Beijing, CN;
Nini Bai, Beijing, CN;
Qiang Chen, Beijing, CN;
Xu Liu, Beijing, CN;
Guodong Jing, Beijing, CN;
Qianqian Zhang, Beijing, CN;
Zhiyong Xue, Beijing, CN;
Qiang Guo, Beijing, CN;
Guofang Xu, Beijing, CN;
Zihua Li, Beijing, CN;
Qiang Wang, Beijing, CN;
Ruiqing Zhang, Beijing, CN;
Xudong Wang, Beijing, CN;
Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;
BOE Technology Group Co., Ltd., Beijing, CN;
Abstract
Provided is a method for manufacturing an array substrate. The method includes: providing a base substrate with a conductive pattern layer, wherein the base substrate is provided with a display region and a peripheral region disposed around the display region, wherein the conductive pattern layer includes a plurality of conductive lines disposed in the peripheral region; forming an electrode material film layer on the conductive pattern layer; forming a mask layer on the electrode material film layer, wherein the mask layer includes a plurality of electrode layer patterns disposed in the display region and protection patterns disposed above the conductive lines; and etching the electrode material film layer and removing the mask layer.