The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Oct. 28, 2021
Applicant:

Samsung Display Co., Ltd., Yongin-Si, KR;

Inventors:

Chungi You, Asan-si, KR;

Sang-Ho Moon, Cheonan-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H10K 50/80 (2023.01); H10K 59/121 (2023.01); H10K 59/131 (2023.01); H10K 71/00 (2023.01); H10K 59/12 (2023.01);
U.S. Cl.
CPC ...
H10K 59/1213 (2023.02); H10K 50/80 (2023.02); H10K 59/1216 (2023.02); H10K 59/131 (2023.02); H10K 71/00 (2023.02); H10K 59/1201 (2023.02);
Abstract

A method of manufacturing a display device may include forming an active pattern on a substrate, the active pattern including a first region, a second region spaced apart from the first region, and a third region disposed between the first region and the second region, forming an insulation layer on the active pattern, defining a first contact hole exposing a portion of the first region, a second contact hole exposing a portion of the second region, and an opening exposing the third region in the insulation layer, forming a conductive pattern filling the first and second contact holes on the insulation layer and removing the third region at a substantially same time, and forming a planarization layer on the conductive pattern.


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