The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Oct. 09, 2020
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventors:

Tomoaki Hatayama, Tsukuba, JP;

Takeyoshi Masuda, Tsukuba, JP;

Shinsuke Harada, Tsukuba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/23 (2025.01); H10D 62/13 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H10D 64/256 (2025.01); H10D 62/157 (2025.01); H10D 62/393 (2025.01); H10D 62/8325 (2025.01);
Abstract

A silicon carbide semiconductor device includes a silicon carbide substrate, a first electrode, and a second electrode. The silicon carbide substrate has a first main surface, a second main surface, a first impurity region, a second impurity region, and a third impurity region. The first electrode is in contact with each of the second impurity region and the third impurity region on the first main surface. The second electrode is in contact with the first impurity region on the second main surface. The second impurity region includes a first region and a second region disposed between the first region and the second main surface and in contact with the first region. An impurity concentration of the first region is more than or equal to 6×10cm.


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