The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Oct. 22, 2021
Tmeic Corporation, Chuo-ku, JP;
Keisuke Inamasa, Tokyo, JP;
TMEIC Corporation, Chuo-ku, JP;
Abstract
A wind pressure type shutter includes first and second rotation shafts, and first and second flaps. The first flap rotatably hung on the first rotation shaft closes a flow path in a vertical position and opens the flow path in a position rotated from the vertical position. The second flap rotatably attached to the second rotation shaft closes the flow path and prevents the rotation of the first flap by an upstream-side end portion of the second flap in a horizontal position, and opens the flow path in a position rotated from the horizontal position. When a negative pressure is generated downstream of the second flap, the second flap rotates to open the flow path and the upstream-side end portion is disengaged from the first flap, so that the first flap rotates toward a downstream side to open the flow path.