The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Dec. 21, 2020
Applicant:
Picosun Oy, Espoo, FI;
Inventor:
Väinö Kilpi, Masala, FI;
Assignee:
Picosun Oy, Espoo, FI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/511 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67178 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/511 (2013.01); H01J 37/32357 (2013.01); H01L 21/67126 (2013.01); H01L 21/67103 (2013.01);
Abstract
A substrate processing apparatus includes an inner chamber formed by an upper portion and a lower portion, a substrate support to support a substrate within the upper portion of the inner chamber, a plasma system to provide the inner chamber with plasma species from the top side of the inner chamber, and an outer chamber surrounding the upper portion of the inner chamber. The lower portion of the inner chamber extends to the outside of the outer chamber and remains uncovered by the outer chamber.