The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Sep. 10, 2021
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Mikiya Sakashita, Nagoya Aichi, JP;
Yukiteru Matsui, Nagoya Aichi, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B24B 1/00 (2006.01); B24B 37/015 (2012.01); B24B 37/04 (2012.01); B24B 37/10 (2012.01); B24B 41/06 (2012.01); C09G 1/02 (2006.01); C09G 1/18 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B24B 1/00 (2013.01); B24B 37/015 (2013.01); B24B 37/044 (2013.01); B24B 37/107 (2013.01); B24B 41/068 (2013.01); C09G 1/02 (2013.01); C09G 1/18 (2013.01); H01L 21/3212 (2013.01);
Abstract
A polishing solution according to an embodiment includes an exothermic agent that generates heat through application of an alternating magnetic field thereto, and a viscosity modifier that undergoes a reversible phase transition between a gel state and a sol state depending on temperature.
Sakashita, Mikiya. (2025). Polishing solution, polishing apparatus, and polishing method (U.S. Patent No. 12300499). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12300499
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile