The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Feb. 11, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Thai Cheng Chua, Cupertino, CA (US);

Christian Valencia, Alhambra, CA (US);

Chikuang Wang, Santa Clara, CA (US);

Bencherki Mebarki, Santa Clara, CA (US);

Hanh Nguyen, San Jose, CA (US);

Philip Allan Kraus, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/02 (2006.01); C23C 16/26 (2006.01); C23C 16/511 (2006.01); H01J 37/32 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/0254 (2013.01); C23C 16/26 (2013.01); C23C 16/511 (2013.01); H01J 37/32192 (2013.01); H01J 37/3244 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Embodiments disclosed herein include methods and apparatuses used to deposit graphene layers. In an embodiment, a method of depositing a graphene layer on a substrate comprises providing a substrate within a modular microwave plasma chamber, and flowing a carbon source and a hydrogen source into the modular microwave plasma chamber. In an embodiment, the method further comprises striking a plasma in the modular microwave plasma chamber, where a substrate temperature is below approximately 400° C., and depositing the graphene layer on the substrate.


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