The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Nov. 08, 2022
Applicant:

Bentley Systems, Incorporated, Exton, PA (US);

Inventors:

Cyril Novel, Paris, FR;

Jean-Philippe Pons, Le Rouret, FR;

Luc Robert, Valbonne, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01); G06T 15/06 (2011.01); G06T 19/20 (2011.01);
U.S. Cl.
CPC ...
G06T 17/005 (2013.01); G06T 15/06 (2013.01); G06T 19/20 (2013.01); G06T 2210/12 (2013.01); G06T 2210/21 (2013.01); G06T 2210/56 (2013.01);
Abstract

A sample may be generated for each point of a plurality of point clouds that represent a scene. A visibility ray may be created between each point of the plurality of point clouds and the one or more sources that generated the point. One or more sample, if any, that intersect a visibility ray may be identified. Each point corresponding to an intersecting sample may be determined to represent or likely represent an unwanted object if the visibility ray is from a different source that did not generate the point and the point is not coherent with any points generated by the different source. A visibility score for each point determined to represent or likely represent an unwanted object may be adjusted. A model may be generated, wherein the model does not include the unwanted object in the scene but includes the permanent object with see-through characteristics in the scene.


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