The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Jan. 12, 2023
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Vibhav Vineet, Bellevue, WA (US);

Michael J. Bentley, Bellevue, WA (US);

Sameera Lanka, Redmond, WA (US);

Weiyao Xie, Redmond, WA (US);

Yash Jain, Atlanta, GA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 40/169 (2020.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06F 40/169 (2020.01); G06N 20/00 (2019.01);
Abstract

A computing device may receive a plurality of sample slides with various layouts, receive a plurality of augmentations, select one or more augmentations from the plurality of augmentations that are compatible with each other, apply the selected augmentations to the plurality of sample slides to create a plurality of perturbed slides, generate a plurality of slide pairs by combining the plurality of sample slides and the plurality of perturbed slides, filter one or more slide pairs of the plurality of slide pairs that are visually the same, generate the synthetic design dataset including the filtered slide pairs and one or more classes of perturbation that are associated with each of the filtered slide pairs, and train a predictive model using synthetic design dataset for predicting one or more predicted augmentations indicative of one or more layout differences between a pair of slides.


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