The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Nov. 14, 2024
Citibank, N.a., New York, NY (US);
Sofia Rahman, New York, NY (US);
James Myers, New York, NY (US);
Prashant Praveen, New York, NY (US);
Shardul Malviya, London, GB;
Wayne Liao, London, GB;
Deepak Jain, London, GB;
Samantha Cory, London, GB;
Mariusz Saternus, Cracow, PL;
Daniel Lewandowski, Cracow, PL;
Biraj Krushna Rath, London, GB;
Stuart Murray, London, GB;
Philip Davies, London, GB;
Payal Jain, London, GB;
Tariq Husayn Maonah, London, GB;
Vishal Mysore, Mississauga, CA;
Ramkumar Ayyadurai, Jersey City, NJ (US);
Chamindra Desilva, London, GB;
William Franklin Cameron, Jacksonville, FL (US);
Miriam Silver, Tel Aviv, IL;
Prithvi Narayana Rao, Allen, TX (US);
Pramod Goyal, Ahmedabad, IN;
Manjit Rajaretnam, Irving, TX (US);
Citibank, N.A., , NY (US);
Abstract
The systems and methods disclosed herein receives artifacts generated using a first set of models within a multi-model superstructure. The multi-model superstructure includes a second set of models to test the first set of models. The multi-model superstructure dynamically routes the artifacts of the first set of models to one or more models of the second set of models by (i) determining a set of dimensions of the artifacts against which to evaluate the artifacts and (ii) identifying the models in the second set used to test the particular dimension. The second set of models then assesses each artifact against a set of assessment metrics. If an artifact fails to meet one or more assessment metrics, the second set of models generates actions to align the artifact with the set of assessment metrics.